Photothermal system based on PCI concept

Photothermal system
-based on Photothermal Common-Path Interferometer (PCI) concept-
【Manufactured by Stanford photo-thermal solutions
※OXIDE Corp. is an official representative of this photothermal system manufactured by Stanford photo-thermal solutions.

Objects to be measured:

  • AR, HR Coatings, Thin films
  • Laser crystals: Nd:YAG, Nd:YVO4, Ti:Saphire, etc.
  • Nonlinear crystals: KTP, LBO, BBO, LiNbO3, LiTaO3, periodically-poled, etc.
  • Composite objects: bonded optics, liquid crystals cells, etc.
  • Semiconductors
  • Liquid and gaseous samples

 

Specifications
Probe laser
Low noise class IIIa He-Ne
Probe wavelength
633 nm
Pump/probe crossing angle
0.1 rad
Pump chopping frequency range
200-800 Hz
Sensitivity to bulk absorption
(minimum absorbed pump power per 1cm length)
1 µW*, CW or average
Sensitivity to surface absorption
(minimum absorbed pump power)
0.1 µW*, CW or average
Transverse resolution in space
60 µm
Longitudinal resolution in space
0.6 mm*
Resolution in time
from 0.01 sec
Precision for relative measurements of absorption
<5%
Lock-in amplifier type
dual-phase
Nnumber of photodetectors
1
  *approximate number (depends on the type of tested optical material)

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